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SENSITIVE, NONINTRUSIVE, INSITU MEASUREMENT OF TEMPORALLY AND SPATIALLY RESOLVED PLASMA ELECTRIC-FIELDS
被引:141
作者
:
MOORE, CA
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
MOORE, CA
[
1
]
DAVIS, GP
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
DAVIS, GP
[
1
]
GOTTSCHO, RA
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
GOTTSCHO, RA
[
1
]
机构
:
[1]
BELL TEL LABS INC,MURRAY HILL,NJ 07974
来源
:
PHYSICAL REVIEW LETTERS
|
1984年
/ 52卷
/ 07期
关键词
:
D O I
:
10.1103/PhysRevLett.52.538
中图分类号
:
O4 [物理学];
学科分类号
:
0702 ;
摘要
:
引用
收藏
页码:538 / 541
页数:4
相关论文
共 13 条
[11]
REED PR, 1972, APPL SPECTROSC, V26, P489
[12]
CONTROL OF PLASMA ETCH PROFILES WITH PLASMA SHEATH ELECTRIC-FIELD AND RF POWER-DENSITY
[J].
ZAROWIN, CB
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
ZAROWIN, CB
;
HORWATH, RS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
HORWATH, RS
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1982,
129
(11)
:2541
-2547
[13]
PLASMA ETCH ANISOTROPY - THEORY AND SOME VERIFYING EXPERIMENTS RELATING ION-TRANSPORT, ION ENERGY, AND ETCH PROFILES
[J].
ZAROWIN, CB
论文数:
0
引用数:
0
h-index:
0
ZAROWIN, CB
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1983,
130
(05)
:1144
-1152
←
1
2
→
共 13 条
[11]
REED PR, 1972, APPL SPECTROSC, V26, P489
[12]
CONTROL OF PLASMA ETCH PROFILES WITH PLASMA SHEATH ELECTRIC-FIELD AND RF POWER-DENSITY
[J].
ZAROWIN, CB
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
ZAROWIN, CB
;
HORWATH, RS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
HORWATH, RS
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1982,
129
(11)
:2541
-2547
[13]
PLASMA ETCH ANISOTROPY - THEORY AND SOME VERIFYING EXPERIMENTS RELATING ION-TRANSPORT, ION ENERGY, AND ETCH PROFILES
[J].
ZAROWIN, CB
论文数:
0
引用数:
0
h-index:
0
ZAROWIN, CB
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1983,
130
(05)
:1144
-1152
←
1
2
→