PROPERTIES OF CHEMICAL-VAPOR-DEPOSITED SILICON-CARBIDE FOR OPTICS APPLICATIONS IN SEVERE ENVIRONMENTS

被引：19

作者：

GOELA, JS ^{[1
]}

PICKERING, MA ^{[1
]}

TAYLOR, RL ^{[1
]}

MURRAY, BW ^{[1
]}

LOMPADO, A ^{[1
]}

机构：

[1] SPIRE CORP,BEDFORD,MA 01730

来源：

APPLIED OPTICS | 1991年 / 30卷 / 22期

关键词：

SIC OPTICS; CVD SIC; OPTICAL PROPERTIES; SPACE OPTICS; LASER OPTICS; X-RAY OPTICS;

D O I：

10.1364/AO.30.003166

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Important data on chemical-vapor-deposited (CVD) SiC concerning the elastic modulus, polishability, scattering measurement, thermal and cryogenic stability, and degradation owing to the effects of atomic oxygen and electron beams have been obtained with the aim of assessing the suitability of SiC as an optical substrate for severe environments. These measurements show that CVD SiC substrates exhibit excellent polishability (< 0.1 nm rms) with low scatter, good retention of mechanical properties up to 1500-degrees-C, superior thermal and cryogenic stability (-190-degrees to 1350-degrees-C) and high resistance to atomic-oxygen and electron-beam degradation. These results suggest that CVD SiC optical substrates will perform extremely well in severe environments such as outer space, and when used in lasers, combustion, and synchrotron x rays.

引用

页码：3166 / 3175

页数：10

共 21 条

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