ION-BEAM ETCHING

被引：122

作者：

GLOERSEN, PG ^{[1
]}

机构：

[1] HEWLETT PACKARD LABS,PALO ALTO,CA 94304

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 01期

关键词：

D O I：

10.1116/1.568767

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：28 / 35

页数：8

共 17 条

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STEEDS, JW ;

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[2] SECONDARY PROCESSES IN EVOLUTION OF SPUTTER-TOPOGRAPHIES [J].

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JOURNAL OF MATERIALS SCIENCE, 1972, 7 (04) :404-&

[3]

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[4] EQUILIBRIUM TOPOGRAPHY OF SPUTTERED AMORPHOUS SOLIDS .2. [J].

CARTER, G ;

COLLIGON, JS ;

NOBES, MJ .

JOURNAL OF MATERIALS SCIENCE, 1971, 6 (02) :115-&

[5] GROWTH OF TOPOGRAPHY DURING SPUTTERING OF AMORPHOUS SOLIDS .4. GENERALIZED THEORY [J].

CARTER, G ;

COLLIGON, JS ;

NOBES, MJ .

JOURNAL OF MATERIALS SCIENCE, 1973, 8 (10) :1473-1481

[6]

Frank F. C., 1958, GROWTH PERFECTION CR, P411

[7]

KAMINSKY M, 1965, ATOMIC IONIC IMPACT, P151

[8]

KARGER AM, 1973, APPL OPT, V12, P212

[9]

KRUMME JP, 1973, IEEE T MAGN, VMAG9, P405

[10]

MEYER PC, 1973, 1973 P ULTR S, P498

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