THIN-FILMS PREPARED BY PLASMA POLYMERIZATION OF METHYL-METHACRYLATE AND THEIR PROPERTIES AS AN ELECTRON-BEAM RESIST

被引:7
作者
MARTINU, L
BIEDERMAN, H
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D O I
10.1016/0042-207X(83)90088-X
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T [工业技术];
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08 ;
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页码:253 / 254
页数:2
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共 11 条
[1]  
BIEDERMAN H, UNPUB NUCLEAR INSTR
[2]   POLYMERIZATION IN RADIO-FREQUENCY GLOW DISCHARGES .1. [J].
BROWN, KC .
EUROPEAN POLYMER JOURNAL, 1972, 8 (01) :117-&
[3]  
Dechant J., 1972, ULTRAROTSPEKTROSKOPI
[4]   VACUUM LITHOGRAPHY USING PLASMA POLYMERIZATION AND PLASMA DEVELOPMENT [J].
HATTORI, S ;
TAMANO, J ;
YAMADA, M ;
IEDA, M ;
MORITA, S ;
YONEDA, K ;
ISHIBASHI, S .
THIN SOLID FILMS, 1981, 83 (02) :189-194
[5]   PLASMA POLYMERIZATION OF FLUOROCARBONS IN RF CAPACITIVELY COUPLED DIODE SYSTEM [J].
KAY, E ;
DILKS, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (01) :1-11
[6]  
LAM DK, 1976, PLASMA CHEM POLYM, P53
[7]   EFFECT OF FREQUENCY ON THE PLASMA POLYMERIZATION OF ETHANE [J].
MORITA, S ;
BELL, AT ;
SHEN, M .
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1979, 17 (09) :2775-2782
[8]   PLASMA POLYMERIZED METHYL-METHACRYLATE AS AN ELECTRON-BEAM RESIST [J].
MORITA, S ;
TAMANO, J ;
HATTORI, S ;
IEDA, M .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (07) :3938-3941
[9]  
SCHMIDT P, COMMUNICATION
[10]   POLYMERIC RESISTS FOR X-RAY LITHOGRAPHY [J].
THOMPSON, LF ;
FEIT, ED ;
BOWDEN, MJ ;
LENZO, PV ;
SPENCER, EG .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (11) :1500-1503