SEMICONDUCTOR MANUFACTURING TECHNOLOGY AT IBM

被引:5
作者
CARRE, H
DOXTATOR, RH
DUFFY, MC
机构
[1] IBM CORP,E FISHKILL FACIL,DIV GEN TECHNOL,HOPEWELL JUNCTION,NY 12533
[2] IBM CORP,BURLINGTON FACIL,DIV GEN TECHNOL,ESSEX JUNCTION,VT 05452
关键词
Compendex;
D O I
10.1147/rd.265.0528
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Semiconductor device manufacture
引用
收藏
页码:528 / 531
页数:4
相关论文
共 26 条
[1]  
AYLING JK, 1971, ISSCC DIGEST TECHNIC, V14, P76
[2]   OPTIMIZATION OF PLASMA PROCESSING FOR SILICON-GATE FET MANUFACTURING APPLICATIONS [J].
BERGENDAHL, AS ;
BERGERON, SF ;
HARMON, DL .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1982, 26 (05) :580-589
[3]   ELECTRON-BEAM PROXIMITY PRINTING - A NEW HIGH-SPEED LITHOGRAPHY METHOD FOR SUB-MICRON STRUCTURES [J].
BOHLEN, H ;
GRESCHNER, J ;
KEYSER, J ;
KULCKE, W ;
NEHMIZ, P .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1982, 26 (05) :568-579
[4]  
BRUNNER RH, 1981, ELECTRONICS, V54, P121
[5]   SEMICONDUCTOR FINAL TEST LOGISTICS AND PRODUCT DISPOSITIONING SYSTEMS [J].
BURGESS, RM ;
KOENS, KB ;
PIGNETTI, EM .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1982, 26 (05) :605-612
[6]  
CHANG THP, 1979, J VAC SCI TECHNOL, V16, P1780
[7]   A HIGH-DENSITY BIPOLAR LOGIC MASTERSLICE FOR SMALL SYSTEMS [J].
CHEN, JZ ;
CHIN, WB ;
JEN, TS ;
HUTT, J .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1981, 25 (2-3) :142-151
[8]   PROCESS-CONTROL OF THE CHLOROBENZENE SINGLE-STEP LIFTOFF PROCESS WITH A DIAZO-TYPE RESIST [J].
COLLINS, GG ;
HALSTED, CW .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1982, 26 (05) :596-604
[9]  
DESIMONE RR, 1979, ISSCC DIGEST TECHNIC, V22, P145
[10]   FEATURE SIZE CONTROL IN IC MANUFACTURING [J].
FRASCH, P ;
SAREMSKI, KH .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1982, 26 (05) :561-567