DISLOCATION MULTIPLICATION IN FCC METALS AT PRESENCE OF HIGH-SHEAR STRESS

被引:3
|
作者
ZARETSKY, E
机构
[1] Ben-Gurion Univ of the Negev, Beer-Sheva, Israel
来源
ACTA METALLURGICA ET MATERIALIA | 1995年 / 43卷 / 01期
关键词
D O I
10.1016/0956-7151(94)00221-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A new model of shock-induced stress relaxation based on multiplication and motion of partial dislocations bounding the stacking fault is suggested. Shock-generated high shear stress leads to stretching of lateral branches of a bowed out dislocation segment (half-loop) followed by collapse of those branches. The result of the collapse is the forming of the ''fresh'' partial dislocation loop bounding the stacking fault area and ''initial'' dislocation half-loop, both being capable of the next multiplication act. After every collapse time interval Delta T the process leads to the doubling of both the dislocation concentration and stacking faults total area. The energy dissipation rate behind the shock front increases exponentially, dW/dt approximate to 2(t/Delta T), but it should be limited as soon as the cross-slip of the ''fresh'' loops will be impeded and the loops doubling will be stopped. An explanation of twinning and shear bands formation in shocked material is proposed.
引用
收藏
页码:193 / 198
页数:6
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