ULTRAFAST UV-LASER-INDUCED OXIDATION OF SILICON - CONTROL AND CHARACTERIZATION OF THE SI-SIO2 INTERFACE

被引：27

作者：

RICHTER, H ^{[1
]}

ORLOWSKI, TE ^{[1
]}

KELLY, M ^{[1
]}

MARGARITONDO, G ^{[1
]}

机构：

[1] UNIV WISCONSIN,DEPT PHYS,MADISON,WI 53706

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 08期

关键词：

D O I：

10.1063/1.334273

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2351 / 2355

页数：5

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