SIMPLE METHOD FOR PREPARING HYDROGENATED AMORPHOUS-SILICON FILMS BY CHEMICAL VAPOR-DEPOSITION AT ATMOSPHERIC-PRESSURE

被引：32
作者：
ELLIS, FB
GORDON, RG
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 09期
关键词：
D O I：
10.1063/1.332717
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：5381 / 5384
页数：4
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