VACANCY-DIFFUSION MODEL FOR QUENCHED-IN E-CENTERS IN CW-LASER ANNEALED VIRGIN SILICON

被引:28
作者
CHANTRE, A
KECHOUANE, M
BOIS, D
机构
来源
PHYSICA B & C | 1983年 / 116卷 / 1-3期
关键词
D O I
10.1016/0378-4363(83)90305-4
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:547 / 552
页数:6
相关论文
共 23 条
[1]   INFLUENCE OF CW LASER SCAN SPEED IN SOLID-PHASE CRYSTALLIZATION OF AMORPHOUS SI FILM ON SI3N4-GLASS SUBSTRATE [J].
AUVERT, G ;
BENSAHEL, D ;
GEORGES, A ;
NGUYEN, VT ;
HENOC, P ;
MORIN, F ;
COISSARD, P .
APPLIED PHYSICS LETTERS, 1981, 38 (08) :613-615
[2]   FORMATION KINETICS OF MOSI2 INDUCED BY CW SCANNED LASER-BEAM [J].
BOMCHIL, G ;
BENSAHEL, D ;
GOLANSKI, A ;
FERRIEU, F ;
AUVERT, G ;
PERIO, A ;
PFISTER, JC .
APPLIED PHYSICS LETTERS, 1982, 41 (01) :46-48
[3]  
Chantre A., 1982, Laser and Electron Beam Interactions with Solids. Proceedings of the Materials Research Society Annual Meeting, P325
[4]   QUANTITATIVE MODEL FOR DIFFUSION OF PHOSPHORUS IN SILICON AND EMITTER DIP EFFECT [J].
FAIR, RB ;
TSAI, JCC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (07) :1107-1118
[5]   QUENCHED-IN DEFECTS IN LASER ANNEALED SILICON [J].
FAN, ZK ;
HO, VQ ;
SUGANO, T .
APPLIED PHYSICS LETTERS, 1982, 40 (05) :418-420
[6]   CALCULATION OF SOLID-PHASE REACTION-RATES INDUCED BY A SCANNING CW LASER [J].
GOLD, RB ;
GIBBONS, JF .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (02) :1256-1258
[7]   DIFFUSION OF GOLD IN SILICON - A NEW MODEL [J].
GOSELE, U ;
MOREHEAD, F ;
FRANK, W ;
SEEGER, A .
APPLIED PHYSICS LETTERS, 1981, 38 (03) :157-159
[8]   DEEP LEVELS IN SCANNED ELECTRON-BEAM ANNEALED SILICON [J].
JOHNSON, NM ;
REGOLINI, JL ;
BARTELINK, DJ ;
GIBBONS, JF ;
RATNAKUMAR, KN .
APPLIED PHYSICS LETTERS, 1980, 36 (06) :425-428
[9]  
Kimerling L. C., 1977, International Conference on Radiation Effects in Semiconductors, P221
[10]   ROLE OF DEFECT CHARGE STATE IN STABILITY OF POINT-DEFECTS IN SILICON [J].
KIMERLING, LC ;
DEANGELIS, HM ;
DIEBOLD, JW .
SOLID STATE COMMUNICATIONS, 1975, 16 (01) :171-174