EPITAXIAL NISI2 FORMATION BY PULSED ION-BEAM ANNEALING

被引：30
作者：
CHEN, LJ
HUNG, LS
MAYER, JW
BAGLIN, JEE
NERI, JM
HAMMER, DA
机构：
[1] CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853
[2] CORNELL UNIV,PLASMA STUDIES LAB,ITHACA,NY 14853
[3] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
APPLIED PHYSICS LETTERS | 1982年 / 40卷 / 07期
关键词：
D O I：
10.1063/1.93192
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：595 / 597
页数：3
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