STABILITY OF ZIRCONIUM PASSIVE FILMS IN NITRIC AND SULFURIC-ACID-SOLUTIONS

被引：0
|
作者：
ELMOTAAL, SMA [1 ]
HILAL, NH [1 ]
BADAWY, WA [1 ]
机构：
[1] CAIRO UNIV,FAC SCI,DEPT CHEM,GIZA,EGYPT
来源：
ELECTROCHIMICA ACTA | 1994年 / 39卷 / 17期
关键词：
CORROSION; ELECTROCHEMISTRY; PASSIVITY; OXIDE FILMS; ZIRCONIUM;
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Anodic oxide films were formed galvanostatically on zirconium in nitric and sulphuric acid solutions. The stability of the formed oxide films were investigated. The effects of formation voltage, formation current density and frequency on the dissolution behaviour of the formed oxide layers in both media were studied. Open-circuit potential and impedance measurements were used. The results reveal that the anodic oxide films formed in nitric acid solutions are more stable than those formed in sulphuric acid solutions under the same conditions. The stability of the anodic oxide films on zirconium was found to depend on the formation medium rather than the dissolving solution.
引用
收藏
页码：2611 / 2617
页数：7
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