III-V STRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY FOR HIGH-SPEED DEVICES

被引:3
作者
MILLER, DL
机构
[1] Rockwell Int Microelectronics, Research & Development Cent,, Thousand Oaks, CA, USA, Rockwell Int Microelectronics Research & Development Cent, Thousand Oaks, CA, USA
关键词
The author wishes to thank Professor Herbert Kroemer; Dr. P. M. Asbeck and Dr. C. P. Lee for helpful discussions in the preparation of this manuscript and to thank Rockwell International Microelectronics Research and Development Center for providing the stimulating environment in which it was written;
D O I
10.1016/0040-6090(84)90063-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
50
引用
收藏
页码:117 / 127
页数:11
相关论文
共 50 条
[1]  
Ankri D., 1982, International Electron Devices Meeting. Technical Digest
[2]  
ASBECK PM, 1982, IEEE ELECTR DEVICE L, V3, P403
[3]  
ASBECK PM, 1984, INT SOLID STATE CIRC
[4]  
ASBECK PM, 1983, UNPUB
[5]   ELIMINATION OF PERSISTENT PHOTOCONDUCTIVITY AND IMPROVEMENT IN SI ACTIVATION COEFFICIENT BY AL SPATIAL SEPARATION FROM GA AND SI IN AL-GA-AS-SI SOLID SYSTEM - A NOVEL SHORT-PERIOD ALAS/N-GAAS SUPER-LATTICE [J].
BABA, T ;
MIZUTANI, T ;
OGAWA, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (10) :L627-L629
[6]   ELECTRON MOBILITIES IN MODULATION DOPED GA0.47IN0.53AS/AL0.48IN0.52AS HETEROJUNCTIONS GROWN BY MOLECULAR-BEAM EPITAXY [J].
CHENG, KY ;
CHO, AY ;
DRUMMOND, TJ ;
MORKOC, H .
APPLIED PHYSICS LETTERS, 1982, 40 (02) :147-149
[7]   GAAS PLANAR TECHNOLOGY BY MOLECULAR-BEAM EPITAXY (MBE) [J].
CHO, AY ;
BALLAMY, WC .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (02) :783-785
[8]   METAL-(N) ALGAAS-GAAS TWO-DIMENSIONAL ELECTRON-GAS FET [J].
DELAGEBEAUDEUF, D ;
LINH, NT .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (06) :955-960
[9]  
DELESCLUSE P, 1981, ELECTRON LETT, V17, P343
[10]   OHMIC CONTACT FORMATION ON INP BY PULSED LASER PHOTOCHEMICAL DOPING [J].
DEUTSCH, TF ;
EHRLICH, DJ ;
OSGOOD, RM ;
LIAU, ZL .
APPLIED PHYSICS LETTERS, 1980, 36 (10) :847-849