LOW-VOLTAGE SPUTTER COATING

被引：0

作者：

ECHLIN, P

CHAPMAN, B

STOTER, L

GEE, W

BURGESS, A

机构：

[1] PYE UNICAM LTD,PHYLIPS ANALYT DEPT,CAMBRIDGE,ENGLAND

[2] POLARON EQUIPMENT LTD,WATFORD,ENGLAND

[3] UNIV CAMBRIDGE,DEPT ZOOL,CAMBRIDGE CB2 3EA,ENGLAND

来源：

SCANNING ELECTRON MICROSCOPY | 1982年

关键词：

D O I：

暂无

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：29 / 38

页数：10

共 8 条

[1] ION-BEAM SPUTTERING - AN IMPROVED METHOD OF METAL-COATING SEM SAMPLES AND SHADOWING CTEM SAMPLES [J].

CLAY, CS ;

PEACE, GW .

JOURNAL OF MICROSCOPY, 1981, 123 (JUL) :25-34

[2]

ECHLIN P, 1981, SCANNING ELECTRON MI, V1, P79

[3]

ECHLIN P, 1980, SCANNING ELECTRON MI, V1, P163

[4] PROPERTIES AND APPLICATIONS OF SADDLE-FIELD ION SOURCES [J].

FRANKS, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :181-183

[5]

FRANKS J, 1978, ULTRAMICROSCOPY, V3, P127

[6]

FRANKS J, 1980, SCANNING ELECTRON MI, V1, P155

[7] FORMATION OF GOLD PARTICLES IN A FLOWING ARGON SYSTEM - ELECTRON-MICROSCOPY OF DENSITY, SIZE DISTRIBUTION AND SIZE DISPERSION [J].

RENOU, A ;

GILLET, M .

JOURNAL OF CRYSTAL GROWTH, 1978, 44 (02) :190-196

[8] SPECIMEN HEATING DURING SPUTTER-COATING [J].

ROBARDS, AW ;

WILSON, AJ ;

CROSBY, P .

JOURNAL OF MICROSCOPY-OXFORD, 1981, 124 (NOV) :143-153

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