ELECTRICAL-RESISTIVITY OF METALLIC THIN-FILMS WITH ROUGH SURFACES

被引:40
作者
LEUNG, KM
机构
来源
PHYSICAL REVIEW B | 1984年 / 30卷 / 02期
关键词
D O I
10.1103/PhysRevB.30.647
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:647 / 658
页数:12
相关论文
共 39 条
[11]   HOMOGENEOUS DYNAMICAL CONDUCTIVITY OF SIMPLE METALS [J].
GOTZE, W ;
WOLFLE, P .
PHYSICAL REVIEW B, 1972, 6 (04) :1226-&
[12]   SCATTERING OF CONDUCTION ELECTRONS BY LOCALIZED SURFACE CHARGES [J].
GREENE, RF ;
ODONNELL, RW .
PHYSICAL REVIEW, 1966, 147 (02) :599-&
[13]   ELECTRICAL PROPERTIES OF THIN-FILM SEMICONDUCTORS [J].
HAM, FS ;
MATTIS, DC .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1960, 4 (02) :143-151
[14]   MEAN FREE PATH AND BOUNDARY INFLUENCES IN THE METALLIC FIELD EFFECT [J].
JURETSCHKE, HJ .
SURFACE SCIENCE, 1964, 2 :40-47
[15]   INFLUENCE OF SURFACE SCATTERING OF ELECTRONS ON METALLIC FIELD EFFECT IN THIN LAYERS [J].
JURETSCHKE, HJ .
SURFACE SCIENCE, 1966, 5 (01) :111-+
[16]  
KONSTANTINOV OV, 1961, SOV PHYS JETP-USSR, V12, P142
[18]   THEORY OF IMPURITY RESISTANCE IN METALS [J].
LANGER, JS .
PHYSICAL REVIEW, 1960, 120 (03) :714-725
[19]  
LARSON DC, 1971, PHYSICS THIN FILMS
[20]  
LEUNG KM, 1983, B AM PHYS SOC, V28, P286