GOLD-EPITAXIAL SILICON HIGH-FREQUENCY DIODES

被引:23
作者
KAHNG, D
DASARO, LA
机构
来源
BELL SYSTEM TECHNICAL JOURNAL | 1964年 / 43卷 / 1P1期
关键词
D O I
10.1002/j.1538-7305.1964.tb04064.x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
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页码:225 / +
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共 10 条
[1]  
BETHE HA, 1942, 1 MIT RAD LAB REP
[2]  
DIETRICH AF, 1961, P IRE, V49, P972
[3]  
HENISCH HK, 1957, RECTIFYING SEMICONDU, P229
[4]   CONDUCTION PROPERTIES OF THE AU-NORMAL-TYPE-SI SCHOTTKY BARRIER [J].
KAHNG, D .
SOLID-STATE ELECTRONICS, 1963, 6 (03) :281-295
[5]   ANOMALOUS IMPURITY DIFFUSION IN EPITAXIAL SILICON NEAR THE SUBSTRATE [J].
KAHNG, D ;
THOMAS, CO ;
MANZ, RC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (11) :1106-1108
[6]  
LEE CA, TO BE PUBLISHED
[7]   DETERMINATION OF AVALANCHE BREAKDOWN IN PN JUNCTIONS [J].
MASERJIAN, J .
JOURNAL OF APPLIED PHYSICS, 1959, 30 (10) :1613-1614
[8]  
SCHARFETTER DL, 1963, IREAIEE SOLID STATE
[9]   EPITAXIAL SILICON FILMS BY THE HYDROGEN REDUCTION OF SIC1 [J].
THEUERER, HC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (07) :649-653
[10]   IMPURITY DISTRIBUTION IN EPITAXIAL SILICON FILMS [J].
THOMAS, CO ;
KAHNG, D ;
MANZ, RC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (11) :1055-1061