INFLUENCE OF FILM THICKNESS AND ANNEALING TEMPERATURE ON SUPERCONDUCTING LI1+XTI2-XO4 THIN-FILMS

被引：5
作者：
INUKAI, T
MURAKAMI, T
机构：
[1] NTT, Ibaraki Electrical, Communication Lab, Tokai, Jpn, NTT, Ibaraki Electrical Communication Lab, Tokai, Jpn
来源：
THIN SOLID FILMS | 1985年 / 128卷 / 3-4期
关键词：
D O I：
10.1016/0040-6090(85)90079-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
16
引用
收藏
页码：275 / 282
页数：8
相关论文
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