HIGH-ACCURACY AND AUTOMATIC-MEASUREMENT OF THE PATTERN LINEWIDTH ON VERY LARGE-SCALE INTEGRATED-CIRCUITS

被引：0
|
作者：
YAMAJI, H
MIYOSHI, M
KANO, M
OKUMURA, K
机构：
[1] TOSHIBA CORP,MFG ENGN LAB,KAWASAKI 210,JAPAN
[2] INTEGRATED CIRCUIT DIV,SAIWAI KU,KAWASAKI 210,JAPAN
来源：
SCANNING ELECTRON MICROSCOPY | 1985年
关键词：
D O I：
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中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
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页码：97 / 102
页数：6
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