HIGH-ACCURACY AND AUTOMATIC-MEASUREMENT OF THE PATTERN LINEWIDTH ON VERY LARGE-SCALE INTEGRATED-CIRCUITS

被引：0

作者：

YAMAJI, H

MIYOSHI, M

KANO, M

OKUMURA, K

机构：

[1] TOSHIBA CORP,MFG ENGN LAB,KAWASAKI 210,JAPAN

[2] INTEGRATED CIRCUIT DIV,SAIWAI KU,KAWASAKI 210,JAPAN

来源：

SCANNING ELECTRON MICROSCOPY | 1985年

关键词：

D O I：

暂无

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：97 / 102

页数：6

共 50 条

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