THERMAL DISTRIBUTION AND THE EFFECT ON RESIST SENSITIVITY IN ELECTRON-BEAM DIRECT WRITE

被引：21

作者：

EIB, NK

KVITEK, RJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584521

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1502 / 1506

页数：5

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