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CHEMICAL ETCHING OF GAAS
被引:24
作者
:
ADACHI, S
论文数:
0
引用数:
0
h-index:
0
ADACHI, S
OE, K
论文数:
0
引用数:
0
h-index:
0
OE, K
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1984年
/ 131卷
/ 01期
关键词
:
D O I
:
10.1149/1.2115492
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:126 / 130
页数:5
相关论文
共 7 条
[1]
CHEMICAL ETCHING CHARACTERISTICS OF (001)GAAS
[J].
ADACHI, S
论文数:
0
引用数:
0
h-index:
0
ADACHI, S
;
OE, K
论文数:
0
引用数:
0
h-index:
0
OE, K
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1983,
130
(12)
:2427
-2435
[2]
CHEMICAL ETCHING CHARACTERISTICS OF (001)INP
[J].
ADACHI, S
论文数:
0
引用数:
0
h-index:
0
ADACHI, S
;
KAWAGUCHI, H
论文数:
0
引用数:
0
h-index:
0
KAWAGUCHI, H
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(06)
:1342
-1349
[3]
ETCHING AND INHIBITION OF THE (III) SURFACES OF THE III-V INTERMETALLIC COMPOUNDS - INSB
[J].
GATOS, HC
论文数:
0
引用数:
0
h-index:
0
GATOS, HC
;
LAVINE, MC
论文数:
0
引用数:
0
h-index:
0
LAVINE, MC
.
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1960,
14
:169
-&
[4]
KERN W, 1978, RCA REV, V39, P278
[5]
SELECTIVE ETCHING OF GALLIUM ARSENIDE CRYSTALS IN H2SO4-H2O2-H2O SYSTEM
[J].
LIDA, S
论文数:
0
引用数:
0
h-index:
0
LIDA, S
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(05)
:768
-&
[6]
NEW ETCHING SOLUTION SYSTEM, H3PO4-H2O2-H2O, FOR GAAS AND ITS KINETICS
[J].
MORI, Y
论文数:
0
引用数:
0
h-index:
0
MORI, Y
;
WATANABE, N
论文数:
0
引用数:
0
h-index:
0
WATANABE, N
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(09)
:1510
-1514
[7]
PREFERENTIAL ETCHING OF GAAS THROUGH PHOTORESIST MASKS
[J].
OTSUBO, M
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
OTSUBO, M
;
ODA, T
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
ODA, T
;
KUMABE, H
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
KUMABE, H
;
MIKI, H
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
MIKI, H
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(05)
:676
-680
←
1
→
共 7 条
[1]
CHEMICAL ETCHING CHARACTERISTICS OF (001)GAAS
[J].
ADACHI, S
论文数:
0
引用数:
0
h-index:
0
ADACHI, S
;
OE, K
论文数:
0
引用数:
0
h-index:
0
OE, K
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1983,
130
(12)
:2427
-2435
[2]
CHEMICAL ETCHING CHARACTERISTICS OF (001)INP
[J].
ADACHI, S
论文数:
0
引用数:
0
h-index:
0
ADACHI, S
;
KAWAGUCHI, H
论文数:
0
引用数:
0
h-index:
0
KAWAGUCHI, H
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(06)
:1342
-1349
[3]
ETCHING AND INHIBITION OF THE (III) SURFACES OF THE III-V INTERMETALLIC COMPOUNDS - INSB
[J].
GATOS, HC
论文数:
0
引用数:
0
h-index:
0
GATOS, HC
;
LAVINE, MC
论文数:
0
引用数:
0
h-index:
0
LAVINE, MC
.
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1960,
14
:169
-&
[4]
KERN W, 1978, RCA REV, V39, P278
[5]
SELECTIVE ETCHING OF GALLIUM ARSENIDE CRYSTALS IN H2SO4-H2O2-H2O SYSTEM
[J].
LIDA, S
论文数:
0
引用数:
0
h-index:
0
LIDA, S
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(05)
:768
-&
[6]
NEW ETCHING SOLUTION SYSTEM, H3PO4-H2O2-H2O, FOR GAAS AND ITS KINETICS
[J].
MORI, Y
论文数:
0
引用数:
0
h-index:
0
MORI, Y
;
WATANABE, N
论文数:
0
引用数:
0
h-index:
0
WATANABE, N
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(09)
:1510
-1514
[7]
PREFERENTIAL ETCHING OF GAAS THROUGH PHOTORESIST MASKS
[J].
OTSUBO, M
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
OTSUBO, M
;
ODA, T
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
ODA, T
;
KUMABE, H
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
KUMABE, H
;
MIKI, H
论文数:
0
引用数:
0
h-index:
0
机构:
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
MITSUBISHI ELECT CORP, CENT RES LAB, ITAMI, HYOGO, JAPAN
MIKI, H
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(05)
:676
-680
←
1
→