LASER STUDIES OF THE REACTIVITY OF SIH WITH THE SURFACE OF A DEPOSITING FILM

被引：89
作者：
HO, P
BREILAND, WG
BUSS, RJ
机构：
来源：
JOURNAL OF CHEMICAL PHYSICS | 1989年 / 91卷 / 04期
关键词：
D O I：
10.1063/1.456971
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
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页码：2627 / 2634
页数：8
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