EFFECTS OF OXYGEN IN ION-BEAM SPUTTER DEPOSITION OF TITANIUM-OXIDES

被引：48

作者：

DEMIRYONT, H

SITES, JR

机构：

[1] Colorado State Univ, Physics Dep,, Fort Collins, CO, USA, Colorado State Univ, Physics Dep, Fort Collins, CO, USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 04期

关键词：

D O I：

10.1116/1.572383

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1457 / 1460

页数：4

共 6 条

[1]

DEMIRYONT H, UNPUB NBS SPECIAL PU

[2]

HSU LS, 1984, UNPUB APPL OPT

[3]

Kaufman H.R., 1975, Advances in Electronics and Electron Physics, V36, P265

[4]

PAK S, 1980, REV SCI INSTRUM, V51, P536, DOI 10.1063/1.1136231

ROSSNAGEL, SM ;

SITES, JR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :376-379

[6] ION-BEAM SPUTTER DEPOSITION OF OPTICAL COATINGS [J].

SITES, JR ;

GILSTRAP, P ;

RUJKORAKARN, R .