REACTIVELY SPUTTERED INDIUM OXIDE DIFFUSION BARRIER

被引：8

作者：

KOLAWA, E

NIEH, CW

MOLARIUS, JM

TRAN, L

GARLAND, C

FLICK, W

NICOLET, MA

SO, FCT

WEI, JCS

机构：

[1] HEWLETT PACKARD,DIV OPTOELECTR,SAN JOSE,CA 95131

[2] INTEL CORP,SANTA CLARA,CA 95051

来源：

THIN SOLID FILMS | 1988年 / 166卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(88)90361-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：15 / 20

页数：6

相关论文

共 21 条

[1] GREEN ML, 1985, J ELECTROCHEM SOC, V132, P2077
[2] REACTIVELY SPUTTERED RUO2 DIFFUSION-BARRIERS
KOLAWA, E
SO, FCT
PAN, ETS
NICOLET, MA
[J]. APPLIED PHYSICS LETTERS, 1987, 50 (13) : 854 - 855
[3] MICROSTRUCTURE OF REACTIVELY SPUTTERED OXIDE DIFFUSION-BARRIERS
KOLAWA, E
NIEH, CW
SO, FCT
NICOLET, MA
[J]. JOURNAL OF ELECTRONIC MATERIALS, 1988, 17 (05) : 425 - 432
[4] KOLAWA E, UNPUB THIN SOLID FIL
[5] CHARACTERIZATION OF REACTIVELY SPUTTERED RUTHENIUM DIOXIDE FOR VERY LARGE-SCALE INTEGRATED METALLIZATION
KRUSINELBAUM, L
WITTMER, M
YEE, DS
[J]. APPLIED PHYSICS LETTERS, 1987, 50 (26) : 1879 - 1881
[6] HEAT MIRROR COATINGS FOR ENERGY CONSERVING WINDOWS
LAMPERT, CM
[J]. SOLAR ENERGY MATERIALS, 1981, 6 (01): : 1 - 41
[7] ELECTRICAL AND OPTICAL PROPERTIES OF SPUTTERED IN2O3 FILMS .I. ELECTRICAL PROPERTIES AND INTRINSIC ABSORPTION
MULLER, HK
[J]. PHYSICA STATUS SOLIDI, 1968, 27 (02): : 723 - &
[8] DIFFUSION-BARRIERS IN LAYERED CONTACT STRUCTURES
NICOLET, MA
BARTUR, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03): : 786 - 793
[9] DIFFUSION BARRIERS IN THIN-FILMS
NICOLET, MA
[J]. THIN SOLID FILMS, 1978, 52 (03) : 415 - 443
[10] MICROSTRUCTURE OF RUO2 LAYER AS DIFFUSION BARRIER BETWEEN AL AND SI SUBSTRATE
NIEH, CW
KOLAWA, E
SO, FCT
NICOLET, MA
[J]. MATERIALS LETTERS, 1988, 6 (5-6) : 177 - 180