DEPOSITION AND PROPERTIES OF PLASMA-ENHANCED CVD TITANIUM SILICIDE

被引：0
作者：
HARA, T
ISHIZAWA, Y
WU, HM
ROSLER, RS
机构：
[1] HOSEI UNIV,KOGANEI,TOKYO 184,JAPAN
[2] ADV SEMICOND MAT AMER INC,PHOENIX,AZ 85040
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C484 / C484
页数：1
相关论文
共 50 条
[31]   Deposition of metastable Ti(1-x)AlxN films by plasma-enhanced CVD [J].
Prange, R. ;
Neuschütz, D. .
Journal De Physique. IV : JP, 1999, 9 pt 2 (08) :8-811
[32]   Deposition of TiN films on various substrates from alkoxide solution by plasma-enhanced CVD [J].
Shimada, S ;
Takada, Y ;
Tsujino, J .
SURFACE & COATINGS TECHNOLOGY, 2005, 199 (01) :72-76
[33]   PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF TUNGSTEN AND TUNGSTEN SILICIDE THIN-FILMS [J].
MCCLATCHIE, S ;
THOMAS, H ;
MORGAN, DV .
APPLIED SURFACE SCIENCE, 1993, 73 :58-63
[34]   Preparation and properties of titanium silicide coating glass by CVD [J].
Du, Jun ;
Du, Piyi ;
Xu, Ming ;
Han, Gaorong ;
Weng, Wenjian ;
Wang, Jianxun .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (12-13) :1308-1313
[35]   STRUCTURAL, AND OPTICAL-PROPERTIES OF AMORPHOUS SELENIUM PREPARED BY PLASMA-ENHANCED CVD [J].
NAGELS, P ;
SLEECKX, E ;
CALLAERTS, R ;
TICHY, L .
SOLID STATE COMMUNICATIONS, 1995, 94 (01) :49-52
[36]   PLASMA-ENHANCED DEPOSITION FOR VLSI APPLICATIONS [J].
HESS, DW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (08) :C354-C354
[37]   Plasma-enhanced chemical vapor deposition [J].
Kakiuchi H. .
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering, 2016, 82 (11) :956-960
[38]   Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method [J].
Song, Heungseop ;
Shin, Donghyuk ;
Jeong, Ji-eun ;
Park, Heungsoo ;
Ko, Dae-Hong .
AIP ADVANCES, 2019, 9 (03)
[39]   Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition [J].
EunYoung Yun ;
WooJae Lee ;
Qi Min Wang ;
SeHun Kwon .
Journal of Materials Science & Technology, 2017, 33 (03) :295-299
[40]   Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition [J].
Yun, Eun-Young ;
Lee, Woo-Jae ;
Wang, Qi Min ;
Kwon, Se-Hun .
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 2017, 33 (03) :295-299
12345