DEPOSITION AND PROPERTIES OF PLASMA-ENHANCED CVD TITANIUM SILICIDE

被引：0
|
作者：
HARA, T
ISHIZAWA, Y
WU, HM
ROSLER, RS
机构：
[1] HOSEI UNIV,KOGANEI,TOKYO 184,JAPAN
[2] ADV SEMICOND MAT AMER INC,PHOENIX,AZ 85040
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C484 / C484
页数：1
相关论文
共 50 条
  • [1] PLASMA-ENHANCED CVD OF TITANIUM SILICIDE
    ROSLER, RS
    ENGLE, GM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04): : 733 - 737
  • [2] PROPERTIES OF TITANIUM SILICIDE FILMS DEPOSITED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
    HEMMES, DG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (06): : 1332 - 1335
  • [3] INTERMETAL DIELECTRIC DEPOSITION BY PLASMA-ENHANCED CVD
    OLMER, LJ
    LORY, ER
    CLAUHS, WW
    HARRUS, A
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (03) : C125 - C125
  • [4] A NEW DEPOSITION MODE IN PLASMA-ENHANCED CRYOGENIC CVD
    SHIN, H
    MIYAZAKI, S
    HIROSE, M
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 : 713 - 716
  • [5] Influence of deposition rate on the structural properties of plasma-enhanced CVD epitaxial silicon
    Chen, Wanghua
    Cariou, Romain
    Hamon, Gwenaelle
    Leal, Ronan
    Maurice, Jean-Luc
    Roca i Cabarrocas, Pere
    SCIENTIFIC REPORTS, 2017, 7
  • [6] Influence of deposition rate on the structural properties of plasma-enhanced CVD epitaxial silicon
    Wanghua Chen
    Romain Cariou
    Gwenaëlle Hamon
    Ronan Léal
    Jean-Luc Maurice
    Pere Roca i Cabarrocas
    Scientific Reports, 7
  • [7] PLASMA-ENHANCED DEPOSITION OF TUNGSTEN, MOLYBDENUM, AND TUNGSTEN SILICIDE FILMS
    TANG, CC
    CHU, JK
    HESS, DW
    SOLID STATE TECHNOLOGY, 1983, 26 (03) : 125 - 128
  • [8] Deposition mechanisms in plasma-enhanced chemical vapor deposition of titanium
    Itoh, T
    Chang, M
    Ellwanger, R
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 1999, 2 (10) : 531 - 533
  • [9] Plasma-Enhanced CVD Equipment for Deposition of Nanocomposite Nanolayered Films
    O. K. Porada
    V. I. Ivashchenko
    L. A. Ivashchenko
    A. O. Kozak
    O. O. Sytikov
    Journal of Superhard Materials, 2019, 41 : 32 - 37
  • [10] Plasma-Enhanced CVD Equipment for Deposition of Nanocomposite Nanolayered Films
    Porada, O. K.
    Ivashchenko, V. I.
    Ivashchenko, L. A.
    Kozak, A. O.
    Sytikov, O. O.
    JOURNAL OF SUPERHARD MATERIALS, 2019, 41 (01) : 32 - 37
12345