PHONON SHIFTS IN ION BOMBARDED GAAS - RAMAN MEASUREMENTS

被引:59
作者
BURNS, G
DACOL, FH
WIE, CR
BURSTEIN, E
CARDONA, M
机构
[1] CALTECH,DIV PHYS MATH & ASTRON,PASADENA,CA 91125
[2] MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER
[3] UNIV PENN,DEPT PHYS,PHILADELPHIA,PA 19101
关键词
IONS; -; PHONONS; SPECTROSCOPY; RAMAN; Applications;
D O I
10.1016/0038-1098(87)91096-9
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
When 15 MeV ions bombarded single crystal GaAs (111), (100), and (110) faces, they leave a strained, crystalline, surface layer with many defects (as well as a buried amorphous layer). Using Raman spectroscopy, we measure the shifts and line widths of the optic phonons of these strained crystalline layers. Using simple models, the possible sources of the phonon shifts are quantitatively considered. We conclude that the strains, and a change in the ionic plasma frequency (LO-TO splitting) due to a ratio of interstitials, or antisites, to atoms in the crystal of approximately equals 2%-3% account for the major portion of the phonon shifts. These effects have been ascribed previously to phonon confinement.
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页码:449 / 454
页数:6
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