FAR-INFRARED DETERMINATION OF CYCLOTRON AND PLASMA-SHIFTED CYCLOTRON RESONANCES IN THIN MBE-GROWN FILMS OF ALPHA-SN

被引:2
|
作者
WOJTOWICZ, T
DOBROWOLSKA, M
YANG, G
LUO, H
FURDYNA, JK
TU, LW
WONG, GK
机构
[1] Notre Dame Univ., IN
关键词
D O I
10.1088/0268-1242/5/3S/054
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Far-infrared cyclotron resonance and plasma-shifted cyclotron resonance were observed in thin layers of alpha -Sn grown by molecular beam epitaxy on CdTe substrates, and were used to determine the effective mass m* of electrons at the Gamma point and to estimate the dielectric constant epsilon . In these experiments the plasma-shifted cyclotron resonance was observed for the first time at frequencies below the plasma edge, omega < omega p. The data give m*=0.0333+or-0.0002, the matrix element E p=24.0+or-0.5 and an estimate of epsilon approximately=23 for a sample with an electron concentration n approximately=3*1017 cm-3, in good agreement with earlier results obtained on bulk samples.
引用
收藏
页码:S248 / S252
页数:5
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