LOW-TEMPERATURE INTERDIFFUSION BETWEEN ALUMINUM THIN-FILMS AND GAAS

被引：23

作者：

CHRISTOU, A ^{[1
]}

DAY, HM ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 09期

关键词：

D O I：

10.1063/1.323294

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4217 / 4219

页数：3

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