SOME ASPECTS OF LI BEHAVIOR IN ION-IMPLANTED HGCDTE

被引:21
作者
BUBULAC, LO
TENNANT, WE
RIEDEL, RA
BAJAJ, J
EDWALL, DD
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 03期
关键词
D O I
10.1116/1.572248
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
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页码:1646 / 1650
页数:5
相关论文
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