SELECTIVE LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN

被引：241

作者：

BROADBENT, EK ^{[1
]}

RAMILLER, CL ^{[1
]}

机构：

[1] APPL MAT INC,SANTA CLARA,CA 95051

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 06期

关键词：

D O I：

10.1149/1.2115864

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1427 / 1433

页数：7

共 19 条

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