SILICON MBE APPARATUS FOR UNIFORM HIGH-RATE DEPOSITION ON STANDARD FORMAT WAFERS

被引：66

作者：

BEAN, JC

SADOWSKI, EA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 02期

关键词：

Compendex;

D O I：

10.1116/1.571347

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

SEMICONDUCTING SILICON

引用

页码：137 / 142

页数：6

共 20 条

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