ELECTRICAL CHARACTERISTICS AND THERMAL-STABILITY OF PLATINUM SILICIDE-TO-SILICON OHMIC CONTACTS METALIZED WITH TUNGSTEN

被引：24
作者：
SINHA, AK [1 ]
机构：
[1] BELL LABS INC, MURRAY HILL, NJ 07974 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 12期
关键词：
D O I：
10.1149/1.2403360
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1767 / 1771
页数：5
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