STRUCTURE, MAGNETIZATION, AND THERMAL-STABILITY OF (100) FECU FILMS DEPOSITED ON PD/CU/SI(100)

被引:1
|
作者
CHANG, CA
机构
[1] IBM T. J. Watson Research Center, Yorktown Heights
关键词
D O I
10.1063/1.350786
中图分类号
O59 [应用物理学];
学科分类号
摘要
(100)-oriented FeCu films, containing 80 and 50 at. % Fe, have been deposited on (100) Si using (100) Pd/Cu seed layers. Heating of the samples helps identify the structures of the FeCu films, especially the one with 50 at. % Fe. The FeCu (50/50) film shows a structure with possibly two phases: one with a lattice spacing close to that of (100) Fe, and one to that of (100) Cu, henceforth assigned to the Fe- and Cu-stabilized FeCu phases, respectively. The FeCu (80/20) film shows only one phase, with a lattice spacing close to that of (100) Fe. Ferromagnetic characteristics are detected up to an anneal of 30 min at 600-degrees-C for the FeCu (80/20) films, with a reduced saturation magnetization above 400-degrees-C. For the FeCu (50/50) films, their ferromagnetic characteristics remain little changed up to 300-degrees-C, with reduced saturation magnetization at 400-degrees-C, and disappear completely after an anneal at 500-degrees-C. The results are compared with those containing elemental Fe layers deposited on different metal seeds, and the reaction mechanisms of the present structures are discussed.
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页码:4443 / 4450
页数:8
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