THERMAL-STABILITY OF OXIDE-FILMS ON CD0.2 HG0.8 TE - A COMBINED SIMS, AES, AND XPS STUDY

被引：22
作者：
KAISER, U
GANSCHOW, O
WIEDMANN, L
BENNINGHOVEN, A
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期
关键词：
D O I：
10.1116/1.572203
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
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页码：657 / 661
页数：5
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