PROCESS TECHNOLOGY OPTIMIZATION USING AN INTEGRATED PROCESS AND DEVICE SIMULATION SEQUENCING SYSTEM

被引：4

作者：

CARTUYVELS, R

BOOTH, R

DUPAS, L

DEMEYER, K

机构：

[1] Advanced Semiconductor Processing/Process and Device Modeling IMEC vzw, B-3001 Leuven

来源：

MICROELECTRONIC ENGINEERING | 1992年 / 19卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(92)90485-A

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper, we discuss a system for performing process optimization, and its application to the optimization of a 0.5mum CMOS process. The approach includes an initial Target-Oriented experimental design strategy, elimination of ineffective parameters, a second set of experiments to determine a set of approximating models for each response, detection of appropriate transformations of input factors which improve the accuracy of the models, and optimization with respect to a set of constraints.

引用

页码：507 / 510

页数：4

共 7 条

[1]

Alvarez, Abdi, Young, Weed, Herald, IEEE Trans. CAD, 7, (1988)

[2]

Lombardi, Microelectronic Engineering, 10, (1991)

[3]

Young, Teplik, Weed, Tracht, Alvarez, IEEE Trans. CAD, 10, (1991)

[4]

Cartuyvels, Booth, Dupas, De Meyer, Conference on Simulation of Semiconductor Devices and Processes (SISDEP), (1991)

[5]

Booth, Dupas, Cartuyvels, De Meyer, International Workshop on VLSI Process and Device Modeling (VPAD), (1991)

[6]

NAG Fortran Library Manual, 4, (1991)

[7]

MINIMOS-5 User's Guide, (1991)

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