ALUMINUM ETCHING IN BORON TRIBROMIDE PLASMAS

被引：17
|
作者：
KEATON, AL
HESS, DW
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期
关键词：
D O I：
10.1116/1.573361
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：962 / 966
页数：5
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