ALUMINUM ETCHING IN BORON TRIBROMIDE PLASMAS

被引：17
|
作者：
KEATON, AL
HESS, DW
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期
关键词：
D O I：
10.1116/1.573361
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：962 / 966
页数：5
相关论文
共 50 条
  • [1] Etching of boron nitride in radio frequency plasmas
    Schaffnit, C
    Thomas, L
    Rossi, F
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (05): : 2816 - 2819
  • [2] Boron tribromide
    Doyagüez, EG
    SYNLETT, 2005, (10) : 1636 - 1637
  • [3] ALUMINUM ETCHING IN CARBON-TETRACHLORIDE PLASMAS
    TOKUNAGA, K
    HESS, DW
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (04) : 928 - 932
  • [4] BORON TRIBROMIDE REACTION WITH ELEMENTAL BORON
    SAVELEV, BA
    KRENEV, VA
    EVDOKIMO.VI
    ZHURNAL NEORGANICHESKOI KHIMII, 1973, 18 (05): : 1413 - 1413
  • [5] REACTION OF METHIONINE WITH BORON TRIBROMIDE AND BORON TRIIODIDE
    ATASSI, MZ
    PERLSTEI.MT
    TETRAHEDRON LETTERS, 1972, (19) : 1861 - &
  • [6] OXIDATION OF BORON TRIBROMIDE BY OXYGEN
    SEVASTJANOVA, TN
    SUVOROV, AV
    VESTNIK LENINGRADSKOGO UNIVERSITETA SERIYA FIZIKA KHIMIYA, 1980, (04): : 103 - 105
  • [7] The reaction of tetramethylsilane with boron tribromide
    Lewkowski, J
    Vaultier, M
    MAIN GROUP METAL CHEMISTRY, 2001, 24 (01): : 13 - 14
  • [8] Mechanism of boron tribromide electroreduction
    Hüseyin Çelikkan
    A. Elif Sanli
    Hasan Aydin
    M. Levent Aksu
    Journal of Applied Electrochemistry, 2009, 39 : 1525 - 1533
  • [9] REACTION OF PENTAFLUOROANILINE WITH BORON TRIBROMIDE
    NAYAR, VSV
    PEACOCK, RD
    NATURE, 1965, 207 (4997) : 630 - &
  • [10] THE HEAT OF HYDROLYSIS OF BORON TRIBROMIDE
    SKINNER, HA
    SMITH, NB
    TRANSACTIONS OF THE FARADAY SOCIETY, 1955, 51 (01): : 19 - 22
12345