PALLADIUM SILICIDE FORMATION UNDER THE INFLUENCE OF NITROGEN AND OXYGEN IMPURITIES

被引：12

作者：

HO, KT

LIEN, CD

NICOLET, MA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 02期

关键词：

D O I：

10.1063/1.334794

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：232 / 236

页数：5

共 20 条

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[4]

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[5]

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[6] AN INERT MARKER STUDY FOR PALLADIUM SILICIDE FORMATION - SI MOVES IN POLYCRYSTALLINE PD2SI [J].

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[7]

HO KT, 1984, MATERIALS RES SOC S, V25, P123

[8] THIN PALLADIUM SILICIDE CONTACTS TO SILICON [J].

KRITZINGER, S ;

TU, KN .

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[9] BEHAVIOR AND INFLUENCE OF OXYGEN IN CHROMIUM SILICIDE FORMATION [J].

LIEN, CD ;

WIELUNSKI, LS ;

NICOLET, MA ;

STIKA, KM .

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[10]

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