AN MEV-ION IMPLANTER FOR LARGE AREA APPLICATIONS

被引：46
|
作者：
HALLEN, A [1 ]
INGEMARSSON, PA [1 ]
HAKANSSON, P [1 ]
SUNDQVIST, BUR [1 ]
POSSNERT, G [1 ]
机构：
[1] SVEDBERG LAB,S-75121 UPPSALA,SWEDEN
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 36卷 / 03期
关键词：
D O I：
10.1016/0168-583X(89)90679-4
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：345 / 349
页数：5
相关论文
共 50 条
  • [21] Epitaxial crystallization and nucleation during MeV-ion beam processing of amorphous GaAs surface layers
    Bachmann, T
    Glaser, E
    Schulz, R
    Kaiser, U
    Safran, G
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 113 (1-4): : 214 - 217
  • [22] Epitaxial crystallization and nucleation during MeV-ion beam processing of amorphous GaAs surface layers
    Bachmann, T.
    Glaser, E.
    Schulz, R.
    Kaiser, U.
    Safran, G.
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1996, 113 (1-4): : 214 - 217
  • [23] H+ emission by MeV-ion impact:: Charge state dependence of energy and angular distributions
    Most, M
    Wien, K
    Brunelle, A
    Della Negra, S
    Depauw, J
    Jacquet, D
    Pautrat, M
    LeBeyec, Y
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 168 (02): : 203 - 214
  • [24] Carbon-cluster formation from polymers caused by MeV-ion impacts and keV-cluster-ion impacts
    Diehnelt, CW
    Van Stipdonk, MJ
    Schweikert, EA
    PHYSICAL REVIEW A, 1999, 59 (06): : 4470 - 4474
  • [25] Carbon-cluster formation from polymers caused by MeV-ion impacts and keV-cluster-ion impacts
    Diehnelt, C.W.
    Van Stipdonk, M.J.
    Schweikert, E.A.
    Physical Review A. Atomic, Molecular, and Optical Physics, 1999, 59 (06):
  • [26] Characterization of a high-density plasma immersion ion implanter with scaleable ECR large-area plasma source
    Glukhoy, Y
    Rahman, M
    Popov, G
    Usenko, A
    Walitzki, HJ
    SURFACE & COATINGS TECHNOLOGY, 2005, 196 (1-3): : 172 - 179
  • [27] IMPULSE ION IMPLANTER
    Stepanov, A. V.
    Shamanin, V. I.
    Remnev, G. E.
    Petrov, A. V.
    2015 42ND IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCES (ICOPS), 2015,
  • [28] LARGE-AREA SHOWER IMPLANTER FOR THIN-FILM TRANSISTORS
    WU, Y
    MONTGOMERY, JH
    REFSUM, A
    MITCHELL, SJN
    ARMSTRONG, BM
    GAMBLE, HS
    IEE PROCEEDINGS-CIRCUITS DEVICES AND SYSTEMS, 1994, 141 (01): : 23 - 26
  • [29] LINE SHIFTS IN MASS-SPECTRA OF SECONDARY IONS EJECTED FROM SOLIDS BY MEV-ION IMPACT
    WIEN, K
    KOCH, C
    VANTAN, N
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1995, 100 (2-3): : 322 - 330
  • [30] Large area smoothing of surfaces by ion bombardment: fundamentals and applications
    Frost, F.
    Fechner, R.
    Ziberi, B.
    Voellner, J.
    Flamm, D.
    Schindler, A.
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2009, 21 (22)
12345