MONITORING CHEMICAL-REACTIONS IN METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION (MOCVD)

被引：0
作者：
WILLIAMS, JO
HOARE, R
HUNT, N
PARROTT, MJ
机构：
来源：
MECHANISMS OF REACTIONS OF ORGANOMETALLIC COMPOUNDS WITH SURFACES | 1989年 / 198卷
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中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
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页码：131 / 143
页数：13
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