SEMI-INSULATING IN0.53GA0.47AS BY FE DOPING

被引:20
作者
CLAWSON, AR [1 ]
MULLIN, DP [1 ]
ELDER, DI [1 ]
WIEDER, HH [1 ]
机构
[1] UNIV CALIF SAN DIEGO,DEPT ELECT ENGN & COMP SCI,LA JOLLA,CA 92093
关键词
D O I
10.1016/0022-0248(83)90253-1
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:90 / 95
页数:6
相关论文
共 20 条
[1]   EFFECT OF BAKING TEMPERATURE ON PURITY OF LPE GA0.47IN0.53AS [J].
AMANO, T ;
TAKAHEI, K ;
NAGAI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (11) :2105-2109
[2]  
GARDNER PD, 1981, RCA REV, V42, P542
[3]   GROWTH OF BUFFERED GAAS-MESFET STRUCTURES BY LPE [J].
HOUSTON, PA .
JOURNAL OF ELECTRONIC MATERIALS, 1980, 9 (01) :79-93
[4]   SCHOTTKY-BARRIER HEIGHT OF N-INXGA1-XAS DIODES [J].
KAJIYAMA, K ;
MIZUSHIMA, Y ;
SAKATA, S .
APPLIED PHYSICS LETTERS, 1973, 23 (08) :458-459
[5]  
KAUMANS K, 1982, I PHYS C SER, V63, P329
[6]   HIGH-RESISTIVITY LPE LAYERS OF GAAS BY IRON DOPING [J].
KOJIMA, K ;
HASEGAWA, H .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1980, 62 (02) :673-679
[7]   LPE GROWTH OF HIGH-PURITY INP AND IN1-XGAXP1-YASY [J].
KUPHAL, E ;
POCKER, A .
JOURNAL OF CRYSTAL GROWTH, 1982, 58 (01) :133-142
[8]   MODEL RELATING ELECTRICAL-PROPERTIES AND IMPURITY CONCENTRATIONS IN SEMI-INSULATING GAAS [J].
LINDQUIST, PF .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (03) :1262-1267
[9]   GROWTH AND PROPERTIES OF SEMI-INSULATING EPITAXIAL GAAS [J].
MATTES, BL ;
HOUNG, YM ;
PEARSON, GL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (04) :869-875
[10]   SCHOTTKY BARRIERS AND OHMIC CONTACTS ON NORMAL-TYPE INP BASED COMPOUND SEMICONDUCTORS FOR MICROWAVE FETS [J].
MORKOC, H ;
DRUMMOND, TJ ;
STANCHAK, CM .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (01) :1-5