ION AND PLASMA ASSISTED ETCHING OF HOLOGRAPHIC GRATINGS

[1] CANTAGREL M, 1973, J MATER SCI, V8, P1711, DOI 10.1007/BF02403521

[2] COMPARISON OF PROPERTIES OF DIFFERENT MATERIALS USED AS MASKS FOR ION-BEAM ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1340 - 1343

[3] THE PROPERTIES AND APPLICATIONS OF LOW-ENERGY PLASMAS [J]. VACUUM, 1984, 34 (3-4) : 343 - 345

[4] INFLUENCE OF SAMPLE INCLINATION AND ROTATION DURING ION-BEAM ETCHING ON ION-ETCHED STRUCTURES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (05): : 1712 - 1717

[5] HUTLEY MC, 1982, TECHNIQUES PHYSICS, V6

[6] PHOTORESIST GRATINGS ON REFLECTING SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1387 - 1390

[7] GUIDED-WAVE HOLOGRAPHIC GRATING BEAM EXPANDER - FABRICATION AND PERFORMANCE [J]. ELECTRONICS LETTERS, 1981, 17 (04) : 165 - 167

[8] Neuman V., 1981, First European Conference on Integrated Optics, P89

[9] PITT CW, 1984, OPTICS COMMUNS, V52, P241

[10] PITT CW, 1984, APPL OPTICS, V23, P3434

[1] CANTAGREL M, 1973, J MATER SCI, V8, P1711, DOI 10.1007/BF02403521

[2] COMPARISON OF PROPERTIES OF DIFFERENT MATERIALS USED AS MASKS FOR ION-BEAM ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1340 - 1343

[3] THE PROPERTIES AND APPLICATIONS OF LOW-ENERGY PLASMAS [J]. VACUUM, 1984, 34 (3-4) : 343 - 345

[4] INFLUENCE OF SAMPLE INCLINATION AND ROTATION DURING ION-BEAM ETCHING ON ION-ETCHED STRUCTURES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (05): : 1712 - 1717

[5] HUTLEY MC, 1982, TECHNIQUES PHYSICS, V6

[6] PHOTORESIST GRATINGS ON REFLECTING SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1387 - 1390

[7] GUIDED-WAVE HOLOGRAPHIC GRATING BEAM EXPANDER - FABRICATION AND PERFORMANCE [J]. ELECTRONICS LETTERS, 1981, 17 (04) : 165 - 167

[8] Neuman V., 1981, First European Conference on Integrated Optics, P89

[9] PITT CW, 1984, OPTICS COMMUNS, V52, P241

[10] PITT CW, 1984, APPL OPTICS, V23, P3434