SELF-PROPAGATING EXPLOSIVE REACTIONS IN AL/NI MULTILAYER THIN-FILMS

被引：160

作者：

MA, E ^{[1
]}

THOMPSON, CV ^{[1
]}

CLEVENGER, LA ^{[1
]}

TU, KN ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

APPLIED PHYSICS LETTERS | 1990年 / 57卷 / 12期

关键词：

D O I：

10.1063/1.103504

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Self-propagating explosive reactions, with a reaction front speed of about 4 m/s, have been observed in free-standing polycrystalline Al/Ni multilayer thin films. The resultant phases and microstructures are compared with those obtained by conventional thermal annealing. We show evidence which indicates that melting occurred in the explosive reactions of films with an atomic concentration ratio of 3Al:1Ni. It is also observed that the propensity of multilayer films to undergo explosive reactions is dependent on the modulation length of the film as well as on the ambient temperature. These observations are interpreted with a simple model based on the rate balance between the rates of heat generation and heat dissipation.

引用

页码：1262 / 1264

页数：3

共 10 条

[1]

BRIAN I, 1977, THERMOCHEMICAL PROPE, P489

[2] EXPLOSIVE SILICIDATION IN NICKEL AMORPHOUS-SILICON MULTILAYER THIN-FILMS [J].