MOLECULAR-BEAM EPITAXY GROWTH OF ZNSE USING A CRACKED SELENIUM SOURCE

被引:38
作者
CHENG, H
DEPUYDT, JM
HAASE, MA
POTTS, JE
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 02期
关键词
D O I
10.1116/1.584850
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
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页码:181 / 186
页数:6
相关论文
共 8 条
[1]   COMMENT ON COMPOSITION OF SELENIUM VAPOR [J].
BERKOWITZ, J ;
CHUPKA, WA .
JOURNAL OF CHEMICAL PHYSICS, 1968, 48 (12) :5743-+
[2]  
Cheng H., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V796, P91, DOI 10.1117/12.941002
[3]   DETECTION AND CONTROL OF IMPURITY INCORPORATION IN MBE-GROWN ZNSE [J].
DEPUYDT, JM ;
SMITH, TL ;
POTTS, JE ;
CHENG, H ;
MOHAPATRA, SK .
JOURNAL OF CRYSTAL GROWTH, 1988, 86 (1-4) :318-323
[4]   INTERACTION KINETICS OF AS2 AND GA ON [100] GAAS SURFACES [J].
FOXON, CT ;
JOYCE, BA .
SURFACE SCIENCE, 1977, 64 (01) :293-304
[5]   DIMER ARSENIC SOURCE USING A HIGH-EFFICIENCY CATALYTIC CRACKING OVEN FOR MOLECULAR-BEAM EPITAXY [J].
GARCIA, JC ;
BARSKI, A ;
CONTOUR, JP ;
MASSIES, J .
APPLIED PHYSICS LETTERS, 1987, 51 (08) :593-595
[6]   CORRELATION BETWEEN ELECTRON TRAPS AND GROWTH-PROCESSES IN N-GAAS PREPARED BY MOLECULAR-BEAM EPITAXY [J].
NEAVE, JH ;
BLOOD, P ;
JOYCE, BA .
APPLIED PHYSICS LETTERS, 1980, 36 (04) :311-312
[7]   EFFECT OF SE VAPOR-PRESSURE AND THERMAL-DISSOCIATION PROCESS ON EXCITONIC-EMISSION LINES IN MOLECULAR-BEAM EPITAXIALLY GROWN HIGH-PURITY ZINC SELENIDE [J].
TAGUCHI, T ;
YAO, T .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (10) :3002-3005
[8]   GROWTH OF UNDOPED, HIGH-PURITY, HIGH-RESISTIVITY ZNSE LAYERS BY MOLECULAR-BEAM EPITAXY [J].
YONEDA, K ;
HISHIDA, Y ;
TODA, T ;
ISHII, H ;
NIINA, T .
APPLIED PHYSICS LETTERS, 1984, 45 (12) :1300-1302