A STUDY OF GE-GAAS INTERFACES GROWN BY MOLECULAR-BEAM EPITAXY

被引:56
作者
STALL, RA
WOOD, CEC
BOARD, K
DANDEKAR, N
EASTMAN, LF
DEVLIN, J
机构
[1] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14853
[2] CORNELL UNIV,NATL RES & RESOURCE FACIL SUBMICRON STRUCT,ITHACA,NY 14853
关键词
D O I
10.1063/1.329254
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:4062 / 4069
页数:8
相关论文
共 26 条
[1]  
BALLINGALL J, UNPUBLISHED
[2]   NON-ALLOYED OHMIC CONTACTS TO NORMAL-GAAS BY MOLECULAR-BEAM EPITAXY [J].
BARNES, PA ;
CHO, AY .
APPLIED PHYSICS LETTERS, 1978, 33 (07) :651-653
[3]   GE-GAAS(110) INTERFACE FORMATION [J].
BAUER, RS ;
MCMENAMIN, JC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1444-1449
[4]   SURFACE AND INTERFACE DEPLETION CORRECTIONS TO FREE CARRIER-DENSITY DETERMINATIONS BY HALL MEASUREMENTS [J].
CHANDRA, A ;
WOOD, CEC ;
WOODARD, DW ;
EASTMAN, LF .
SOLID-STATE ELECTRONICS, 1979, 22 (07) :645-650
[5]   SPECIFIC CONTACT RESISTANCE OF METAL-SEMICONDUCTOR BARRIERS [J].
CHANG, CY ;
FANG, YK ;
SZE, SM .
SOLID-STATE ELECTRONICS, 1971, 14 (07) :541-&
[6]   CONDUCTION PROPERTIES OF GE-GAAS1-XPX N-N HETEROJUNCTIONS [J].
CHANG, LL .
SOLID-STATE ELECTRONICS, 1965, 8 (09) :721-&
[7]   IMPURITY PROFILES OF GAAS EPITAXIAL LAYERS DOPED WITH SN, SI, AND GE GROWN WITH MOLECULAR-BEAM EPITAXY [J].
CHO, AY .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (04) :1733-1735
[8]  
CRISTON A, 1979, SOLID STATE ELECTRON, V22, P141
[10]   A MOLYBDENIUM SOURCE, GATE AND DRAIN METALLIZATION SYSTEM FOR GAAS-MESFET LAYERS GROWN BY MOLECULAR-BEAM EPITAXY [J].
DEVLIN, WJ ;
WOOD, CEC ;
STALL, R ;
EASTMAN, LF .
SOLID-STATE ELECTRONICS, 1980, 23 (08) :823-829