STUDY OF GROWTH-RATE AND FAILURE MODE OF CHEMICALLY VAPOR-DEPOSITED TIN, TICXNY AND TIC ON CEMENTED TUNGSTEN CARBIDE

被引:45
作者
CHO, JS
NAM, SW
CHUN, JS
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D O I
10.1007/BF00543880
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T [工业技术];
学科分类号
08 ;
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页码:2495 / 2502
页数:8
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