DIFFUSION OF GE IN SIGE ALLOYS

被引：122

作者：

MCVAY, GL ^{[1
]}

DUCHARME, AR ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

PHYSICAL REVIEW B | 1974年 / 9卷 / 02期

关键词：

D O I：

10.1103/PhysRevB.9.627

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：627 / 631

页数：5

共 50 条

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APPLIED SURFACE SCIENCE, 2003, 212 :244-248

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Fadaly, Elham M. T. ;

Dijkstra, Alain ;

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[30] MONTE-CARLO SIMULATIONS OF GE SEGREGATION IN STRAINED SI AND SIGE ALLOYS [J].

LARSSON, MI ;

HANSSON, GV .

SURFACE SCIENCE, 1993, 291 (1-2) :117-128

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