NANO-CRYSTALLINE SILICON FILMS PRODUCED BY LAYER-BY-LAYER DEPOSITION TECHNIQUE AND THEIR NOVEL PROPERTIES

被引：0
|
作者：
CHEN, MR
CHEN, KJ
机构：
来源：
ACTA PHYSICA SINICA-OVERSEAS EDITION | 1994年 / 3卷 / 04期
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暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
We have applied the layer-by-layer deposition technique to the growth of nanocrystalline silicon films by varying the hydrogen plasma exposure time. The tailoring effect of hydrogen plasma has been studied. The novel optical and electronic properties of these films have also been reported.
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页码：250 / 254
页数：5
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