TIME-DEPENDENT VARIATION OF COMPOSITION OF SCL SOLUTION

被引：0

作者：

TAKAHASHI, I

KOBAYASHI, H

RYUTA, J

KISHIMOTO, M

SHINGYOUJI, T

机构：

[1] Central Research Institute, Mitsubishi Materials Corporation, Omiya

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1993年 / 32卷 / 9A期

关键词：

SILICON; SURFACE; CLEANING; SOLUTION; COMPOSITION;

D O I：

10.1143/JJAP.32.L1183

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We investigated the time-dependent variation of composition of NH4OH/H2O2/H2O mixture, the standard cleaning 1 (SC1) solution in the RCA cleaning process. The NH4OH concentration decreased with time and that of H2O2 was almost constant. It was clarified that the decrease rate of NH4OH concentration depended on the temperature and H2O2 Concentration in the SC1 solution. As the temperature was raised, the decrease rate accelerated Conversely, as H2O2 concentration was raised, the rate decelerated. It is concluded that the hydrogen bond between NH3 and H2O2 prevents NH3 evaporation.

引用

页码：L1183 / L1185

页数：3