OPTICAL INVESTIGATIONS ON ISOVALENT DELTA-LAYERS IN III-V SEMICONDUCTOR COMPOUNDS

被引:29
|
作者
SCHWABE, R
PIETAG, F
FAULKNER, M
LASSEN, S
GOTTSCHALCH, V
FRANZHELD, R
BITZ, A
STAEHLI, JL
机构
[1] UNIV LEIPZIG,FAK PHYS & GEOWISSENSCH,INST EXPTL PHYS 2,D-04103 LEIPZIG,GERMANY
[2] UNIV LEIPZIG,FAK CHEM & MINERAL,INST ANORGAN CHEM,D-04103 LEIPZIG,GERMANY
[3] ECOLE POLYTECH FED LAUSANNE,INST PHYS APPL,CH-1015 LAUSANNE,SWITZERLAND
关键词
D O I
10.1063/1.359097
中图分类号
O59 [应用物理学];
学科分类号
摘要
In contrast to usual quantum wells or barriers having a thickness of some lattice constants, spatially well-separated, electronically uncoupled monolayers of group-III or V elements are considered as isovalent δ doping or δ layers. Similar to the case of randomly distributed nitrogen dopants in GaP bulk material, it is shown that the two-dimensional arrangement of isovalent atoms brings forth a new quality of III-V semiconductor compounds: The optical emission and absorption properties near the fundamental band gap of indirect-gap, and even of direct-gap, host material, where the isovalent layers are incorporated, are drastically improved. Low-temperature luminescence and transmission experiments on metal-organic vapor-phase epitaxially grown InAs δ layers in GaAs, AlAs δ layers in GaAs, and GaAs monolayers in AlAs are dealt with. © 1995 American Institute of Physics.
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页码:6295 / 6299
页数:5
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